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KJLC® Awarded a Patent for Its Atomic Layer Deposition System and Process weblink

Kurt J. Lesker Company Ltd 2 Jan 2018

The Kurt J. Lesker Company® (KJLC®) recently announced that the United States Patent and Trademark Office has issued a US patent covering the design of an atomic layer deposition system and the process to use that system to deposit highly precise and conformal thin films. 

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