Exploring flatlands: characterizing 2D materials with atomic force microscopy

Webinar presented by Prof. Andras Kis, EPFL, STI-IEL-LANES and Keith Jones, Oxford Instruments Asylum Research

Exploring flatlands: characterizing 2D materials with atomic force microscopy

13th December 2016 11am EST


The atomic force microscope (AFM) has played an essential role in 2D materials research since it was used to confirm the first isolation of graphene. Today’s AFMs are even more powerful, with higher spatial resolution, faster imaging rates, greater environmental control and enhanced modes for mapping physical properties. They can image crystal lattice structure as well as nanoscale morphology, and sense local electrical, mechanical and functional response in more ways than ever before. 

In this webinar we explore the latest AFM tools that enable higher resolution, sensitivity and more quantitative results for analysing 2D materials. We’ll present results from measurements of a variety of 2D materials for device manufacturing, energy storage and optoelectronics including:
• MoS2 and graphene;
• measurements of mechanical properties;
• kelvin probe imaging (KPFM) of operating transistors;
• electromechanical measurements.

We specifically detail AFM modes including:
• conductive AFM;
• piezoresponse imaging;
• scanning microwave impedance imaging (sMIM).

Finally, we discuss how AFM can now be used to accurately determine the thickness of single or multiple layers of a 2D material. This will challenge the misconception that AFM cannot be used to precisely measure the thickness of 2D materials.