Oxford Instruments Plasma Technology offers flexible etch, deposition and growth process tools and leading-edge processes for the engineering of semiconductor structures and devices.
Our systems provide solutions for precise materials deposition, etching of nanometre-sized features and controlled growth of nanostructures, based on core technologies.
- Plasma Etch & Deposition
- Atomic Layer Deposition (ALD)
- Ion Beam Etch & Deposition
- Deep Silicon Etch
- Physical Vapour Deposition
We offer an extensive process library of over 6,000 recipes developed in our process laboratories in the UK and Taiwan. Our processes are backed by process guarantees for key properties and repeatability such as rate and uniformity to ensure rapid start-up during installation.
- Compound Semi processes
- Micro/Nano applications
- Si front-end processes
- Si back-end processes