We’re excited to launch the MoS2 growth process using our high performance Nanofab® nanoscale growth system.
“Low temperature plasma-assisted ALD of conductive films” will be presented by Brodie Mackenzie, September 28, 2015 at 10.25
Webinar presented by Dr Andrey V Kretinin (University of Manchester, UK), Dr Ravi Sundaram (Oxford Instruments, UK) and Dr A A Bol (Eindhoven University of Technology, Netherlands)
Webinar presented by Deirdre Olynick (Lawrence Berkeley National Laboratory) and Kim Lee (Seagate)
Now available for iPhone and iPad: Oxford Instruments Plasma Technology periodic table App for plasma etch & deposition processing
Oxford Instruments Plasma Technology’s newly updated App for iPhone allows the user to look up process chemistries in order to etch or deposit any material through an easy periodic table interface.